Multi-functional PVD system
- Sputter + E-beam
- DC sputtering(Metal)
- RF sputtering(Oxide)
- E-beam evaporation (6 target)
Thermal evaporator
- Single or co-evaporation
- Evaporation (4 inch)
Magnetron sputtering system
-RF Sputtering(Graphite, Nitried)
-RF Generator: 13.56 MHz, 12.56 MHz
Thermal CVD system
-Ar, H2, CH4, N2 Gas
-1000℃ Anealing
-MOS2, Graphene
Vacuum probe station
- Vacuum & heating
- high resolution optical microscope
- 4 SMU + 2 WGFMU
- AC/DC measurement
Semiconductor parameter analyzer
- Keysight B1500
- high-resolution signal
- Pulse measurement unit
- Temperature controller
- Gas flow controller
Glove box system
- Ar condition
Optical Microscope
Vacuum oven
- Drying & annealing under vacuum
Ultra sonicator
- Sample cleaning
Vacuum desiccator
- UV blocking
- Vacuum condition